Allmänt. Terminologi. Standardisering. Dokumentation

Kommittébeteckning: SIS/TK 116 (Oorganiska ytbeläggningar)
Källa: ISO
Svarsdatum: den 9 mar 2023
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This document defines general terms and film growth processes for atomic layer deposition (ALD).
ALD technique is classified into conventional time separated ALD and spatial ALD according to the separation between sequential surface reactions of precursors on substrate. Besides planar substrate, ALD can be used for coating on micro-nano particles, which is developed as powder ALD. Some energy enhanced ALD techniques are also included. This document specifies the processes of different ALD methods.
This document refers to the process of ALD. It does not refer to the deposited materials or specific nanostructures.
This document applies to industrial production, scientific research, teaching, publishing and scientific and technological communications related to ALD.

Kommittébeteckning: SIS/TK 280 (Industriell data och interoperabilitet)
Källa: ISO
Svarsdatum: den 13 mar 2023
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This document specifies the vocabulary for the ISO 10303 series.
NOTE 1 Entries in Clause 4 and Clause 5 may be incompletely defined in this document as the complete description of the EXPRESS type declaration may not be included in this document.
NOTE 2 The terms defined in ISO 10303-243, ISO 10303-4442 and ISO 10303-4443 are omitted.

Kommittébeteckning: SIS/TK 614 (Blockchain)
Källa: ISO
Svarsdatum: den 22 mar 2023
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This document provides fundamental terminology for blockchain and distributed ledger technologies.